Materials Processing

Micro patterning and Nano processing

This special issue includes topics mainly related to semiconductor research and industry, and in addition to other research and manufacturing sectors where lithography and pattern transfer are important. Contributions are focused on the lithographic material, lithographic process, metrology, and finally on advanced etching and patterning. Contributions should be mainly concentrated in a single process/method, from the tentative list below:

• EUV, and optical lithography

• Electron and Ion Beam Lithography

• Nanoimprint Lithography including R2R nanoimprint, Soft Lithography